Company Filing History:

8 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2009-2023

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11762304 - Lithographic apparatus (2023-09-19),

2. 10459354 - Lithographic apparatus and lithographic projection method (2019-10-29),

3. 10444632 - Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrate (2019-10-15),

4. 9989858 - Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrate (2018-06-05),

5. 9081311 - Lithographic apparatus and device manufacturing method (2015-07-14),

6. 8810769 - Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus (2014-08-19),

7. 7963144 - Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system (2011-06-21),

8. 7624617 - Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system (2009-12-01),

Title: Bart Dinand Paarhuis: A Pioneer of Innovation in Lithographic Apparatus

Introduction:

Bart Dinand Paarhuis, a visionary inventor hailing from Waalre, NL, stands as a testament to the power of innovation and perseverance in the field of lithographic apparatus. With a portfolio boasting 8 patents, Paarhuis continues to inspire aspiring inventors globally to push the boundaries of what is possible.

Latest Patents:

Paarhuis' latest patents showcase his ingenuity in the field of lithographic apparatus. The first patent entails an innovative acoustic filter that reduces the transmission of acoustic disturbances without increasing flow resistance. The second patent introduces a transparent layer deformation-determining device that compensates for the deformation of the transparent layer during scanning movements, enhancing the precision of lithographic projections.

Career Highlights:

Throughout his illustrious career, Bart Dinand Paarhuis has made significant contributions to the industry. His work at ASML Netherlands B.V. and ASML Holding N.V. has been pivotal in advancing lithographic technology, setting new standards for precision and efficiency in the manufacturing processes.

Collaborations:

Paarhuis has collaborated with esteemed coworkers such as Frank Johannes Jacobus Van Boxtel and Jeroen Gerard Gosen. Together, they have synergized their expertise to drive innovation in lithographic apparatus, creating groundbreaking solutions that have redefined industry benchmarks.

Conclusion:

In conclusion, Bart Dinand Paarhuis' relentless pursuit of innovation and his groundbreaking inventions in lithographic apparatus have left an indelible mark on the industry. His legacy continues to inspire a new generation of inventors to strive for excellence and push the boundaries of technological advancement.

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