The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Jul. 03, 2012
Applicants:

Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;

Jeroen Gerard Gosen, Geldrop, NL;

Anthonie Kuijper, Best, NL;

Arjan Hubrecht Josef Anna Martens, Valkenburg, NL;

Jean-philippe Xavier Van Damme, Wezembeek-Oppem, BE;

Peter Schoenmakers, Boxtel, NL;

Franciscus Joannes Anthonius Evers, Selfkant-Mille, DE;

Jaap Wilhelmus Petrus Van Empel, Bergeijk, NL;

Léon Hubert Joseph Coumans, Schinnen, NL;

Justin Johannes Hermanus Gerritzen, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); G03F 7/70933 (2013.01); G03F 7/70866 (2013.01); G03F 7/70916 (2013.01);
Abstract

A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.


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