The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Dec. 16, 2010
Jeroen Gerard Gosen, Geldrop, NL;
Albert Johannes Maria Jansen, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Marco Koert Stavenga, Eindhoven, NL;
Koen Steffens, Veldhoven, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Henricus Jozef Castelijns, Bladel, NL;
Koen Cuypers, Lommel, BE;
Jeroen Gerard Gosen, Geldrop, NL;
Albert Johannes Maria Jansen, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Marco Koert Stavenga, Eindhoven, NL;
Koen Steffens, Veldhoven, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Henricus Jozef Castelijns, Bladel, NL;
Koen Cuypers, Lommel, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.