Valbonne, France

Jean-Pierre Faurie

USPTO Granted Patents = 20 


 

Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 85(Granted Patents)


Company Filing History:


Years Active: 2006-2024

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20 patents (USPTO):Explore Patents

Title: Jean-Pierre Faurie: Innovator in Semiconductor Technology

Introduction

Jean-Pierre Faurie is an accomplished inventor based in Valbonne, France, with a remarkable portfolio of 20 patents. His work primarily focuses on advancements in semiconductor materials, particularly in the field of group 13 nitride compounds. Faurie's contributions to this area have significantly impacted the industry through innovative processes and technologies.

Latest Patents

Among his latest inventions are the "N-CO-doped semiconductor substrate" and a unique process for fabricating a single-crystal semiconductor material of group 13 nitride, specifically gallium nitride (GaN). Additionally, he has developed a manufacturing process for semiconductor material of element III nitride that incorporates different crystalline orientation zones to improve production efficiency and material quality.

Career Highlights

Faurie has worked with several prominent companies throughout his career, including Saint-Gobain Cristaux et Détecteurs and Lumilog. These experiences have allowed him to refine his skills and contribute to his field significantly. His extensive knowledge in semiconductor manufacturing has positioned him as a leading figure in the industry.

Collaborations

Throughout his career, Jean-Pierre Faurie has collaborated with notable coworkers, including Bernard Beaumont and Pierre Gibart. Their combined expertise has played a crucial role in advancing the technologies related to semiconductor materials, fostering an environment of innovation and discovery.

Conclusion

In summary, Jean-Pierre Faurie's contributions to the semiconductor industry make him a notable inventor in the field. His latest patents demonstrate his commitment to advancing technology and enhancing manufacturing processes. As he continues to innovate, his work will undoubtedly inspire future advancements in semiconductor technology.

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