Jaw-Jung Shin

This inventor holds 42 USPTO granted patents, primarily in Lithography Techniques. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2004-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaw-Jung Shin. Retrieved from https://idiyas.com/inventor/jaw-jung-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 42

% Patents Active = 50.0

Average Co-Inventor Count = 4.1

ph-index = 12

Forward Citations = 695(Granted Patents)

Company Filing History:

42 out of 42,872

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2004-2023

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Areas of Expertise:

Phase Shift Mask

Electron Beam Lithography

Pattern Generator

Lithographic Processes

Critical Dimension Accuracy

Grid Refinement

High-Throughput Exposure

Multiple-Patterning

EUV Power Improvement

Proximity Correction

Dithering Methods

Semiconductor Device Manufacturing

42 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11670541 - Methods of manufacturing semiconductor device using phase shift mask (2023-06-06),

2. 11189521 - Methods of manufacturing redistribution circuit structures using phase shift mask (2021-11-30),

3. 9911575 - Apparatus for charged particle lithography system (2018-03-06),

4. 9810994 - Systems and methods for high-throughput and small-footprint scanning exposure for lithography (2017-11-07),

5. 9678434 - Grid refinement method (2017-06-13),

6. 9538628 - Method for EUV power improvement with fuel droplet trajectory stabilization (2017-01-03),

7. 9529271 - Grid refinement method (2016-12-27),

8. 9519225 - Systems and methods for high-throughput and small-footprint scanning exposure for lithography (2016-12-13),

9. 9390891 - Apparatus for charged particle lithography system (2016-07-12),

10. 9329488 - Grid refinement method (2016-05-03),

11. 9291913 - Pattern generator for a lithography system (2016-03-22),

12. 9229332 - Systems and methods for high-throughput and small-footprint scanning exposure for lithography (2016-01-05),

13. 9182660 - Methods for electron beam patterning (2015-11-10),

14. 9176389 - Grid refinement method (2015-11-03),

15. 9147377 - Method for image dithering for lithographic processes (2015-09-29),

Title: Jaw-Jung Shin: Innovator from Hsinchu

Introduction: Jaw-Jung Shin is a renowned inventor hailing from Hsinchu, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jaw-Jung Shin holds several patents in the areas of semiconductor technology, renewable energy, and advanced materials, showcasing his diverse expertise and innovative mindset.

Career Highlights: With a career spanning over two decades, Jaw-Jung Shin has worked with leading tech companies and research institutions, playing a pivotal role in developing cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Jaw-Jung Shin has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge exchange to drive progress in the field of technology.

Conclusion: Jaw-Jung Shin's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his position as a visionary inventor, shaping the future of technology and inspiring the next generation of innovators.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]