James M Blackwell

This inventor holds 56 USPTO granted patents and 12 published patent applications and 2 EPO patents, primarily in Semiconductor Fabrication (CPC class H01L). Top assignees: Intel Corporation, Massachusetts Institute of Technology. Active years: 2005-2025.

USPTO Granted Patents = 56 (Patent Applications = 12)

% Patents Active = 60.7

EPO Patents = 2 (Patent Applications = 11)

Average Co-Inventor Count = 4.3

ph-index = 8

Forward Citations = 204(Granted Patents)

Forward Citations (Not Self Cited) = 176(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Portand, OR (US) (2015)
Portland, OR (US) (2005 - 2024)

Company Filing History:

Massachusetts Institute of Technology

patents

Years Active: 2005-2025

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Areas of Expertise:

Semiconductor Structures

Advanced Lithography

Interconnect Structures

Dielectric Materials

EUV Lithography

Directed Self-Assembly

Chain Scission Photoresists

Surface Modifications

Nanoparticles

Photoresist Techniques

Atomic Layer Deposition

Selective Etching

56 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12482744 - Subtractively patterned interconnect structures for integrated circuits (2025-11-25),

2. 12341061 - Bottom-up fill dielectric materials for semiconductor structure fabrication and their methods of fabrication (2025-06-24),

3. 12260296 - Diamondoid materials in quantum computing devices (2025-03-25),

4. 12218052 - Advanced lithography and self-assembled devices (2025-02-04),

5. 12037434 - Chemical compositions and methods of patterning microelectronic device structures (2024-07-16),

6. 12036578 - Interconnect structure surface modifications by passivating agents (2024-07-16),

7. 12027458 - Subtractively patterned interconnect structures for integrated circuits (2024-07-02),

8. 12012473 - Directed self-assembly structures and techniques (2024-06-18),

9. 11984317 - EUV patterning methods, structures, and materials (2024-05-14),

10. 11955377 - Differential hardmasks for modulation of electrobucket sensitivity (2024-04-09),

11. 11955343 - Two-stage bake photoresist with releasable quencher (2024-04-09),

12. 11953826 - Lined photobucket structure for back end of line (BEOL) interconnect formation (2024-04-09),

13. 11874600 - Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists (2024-01-16),

14. 11854787 - Advanced lithography and self-assembled devices (2023-12-26),

15. 11846883 - Chain scission photoresists and methods for forming chain scission photoresists (2023-12-19),

Title: Discovering the Innovations of James M Blackwell

Introduction

James M Blackwell is a prominent inventor located in Portland, Oregon. With an impressive portfolio of 53 patents, he has made significant contributions to the field of advanced lithography and microelectronic devices. His innovations are instrumental in pushing the boundaries of technology.

Latest Patents

Among his latest patents, Blackwell has developed advanced lithography techniques that include sub-10 nm pitch patterning and the structures that result from these methods. In addition, he has devised self-assembled devices and their fabrication techniques, showcasing his expertise in this cutting-edge field. Another notable patent involves a unique chemical composition that features a polymer chain with a surface anchoring group. This innovation is designed to enhance patterning processes for microelectronic device structures, making it easier to integrate selective materials such as metals or dielectrics.

Career Highlights

James M Blackwell has worked with esteemed organizations, including Intel Corporation and the Massachusetts Institute of Technology (MIT). His tenure at these institutions has allowed him to collaborate with some of the brightest minds in the industry and has further solidified his reputation as a leading inventor in his field.

Collaborations

Throughout his career, Blackwell has collaborated with various experts, including notable colleagues like Robert L Bristol and Marie Krysak. These partnerships have fostered innovation and allowed for the development of groundbreaking technologies that have impacted the industry significantly.

Conclusion

James M Blackwell's contributions to the realm of innovation, particularly in lithography and microelectronics, are truly remarkable. His extensive patent portfolio and collaborative efforts highlight his position as a key figure in advancing technology. As he continues to develop new ideas and inventions, the future looks promising for continued advancements in these critical areas.