The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Mar. 22, 2022
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Robert L. Bristol, Portland, OR (US);
Marie Krysak, Portland, OR (US);
James M. Blackwell, Portland, OR (US);
Florian Gstrein, Portland, OR (US);
Kent N. Frasure, Forest Grove, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/203 (2013.01); G03F 7/38 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/76801 (2013.01); H01L 21/76808 (2013.01); H01L 21/76816 (2013.01);
Abstract
Two-stage bake photoresists with releasable quenchers for fabricating back end of line (BEOL) interconnects are described. In an example, a photolyzable composition includes an acid-deprotectable photoresist material having substantial transparency at a wavelength, a photo-acid-generating (PAG) component having substantial transparency at the wavelength, and a base-generating component having substantial absorptivity at the wavelength.