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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11955343 B1

PDFFull Text
Date of Patent:
Apr. 09, 2024

Filed:

Mar. 22, 2022

Two-stage bake photoresist with releasable quencher

Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Robert L. Bristol, Portland, OR (US);

Marie Krysak, Portland, OR (US);

James M. Blackwell, Portland, OR (US);

Florian Gstrein, Portland, OR (US);

Kent N. Frasure, Forest Grove, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:

Schwabe, Williamson & Wyatt, P.C.

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/203 (2013.01); G03F 7/38 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/76801 (2013.01); H01L 21/76808 (2013.01); H01L 21/76816 (2013.01);
Abstract

Two-stage bake photoresists with releasable quenchers for fabricating back end of line (BEOL) interconnects are described. In an example, a photolyzable composition includes an acid-deprotectable photoresist material having substantial transparency at a wavelength, a photo-acid-generating (PAG) component having substantial transparency at the wavelength, and a base-generating component having substantial absorptivity at the wavelength.

Find Patent Forward Citations

Bristol, Robert. (2024). Two-stage bake photoresist with releasable quencher (U.S. Patent No. 11955343). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11955343

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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