Kent N Frasure is a notable inventor based in Forest Grove, OR (US). He has made significant contributions to the field of photoresist technology, particularly in the fabrication of back end of line (BEOL) interconnects. With a total of 2 patents to his name, Frasure continues to push the boundaries of innovation in his field.

Latest Patents

Frasure's latest patents include advancements in two-stage bake photoresists with releasable quenchers. These innovations are crucial for the development of BEOL interconnects. The patents describe a photolyzable composition that includes an acid-deprotectable photoresist material, a photo-acid-generating (PAG) component, and a base-generating component. Each of these components has been designed to have substantial transparency or absorptivity at specific wavelengths, enhancing the effectiveness of the photoresist technology.

Career Highlights

Kent N Frasure is currently employed at Intel Corporation, where he applies his expertise in photoresist technology. His work at Intel has positioned him as a key player in the advancement of semiconductor manufacturing processes. Frasure's innovative approach has led to significant improvements in the efficiency and effectiveness of photoresist materials.

Collaborations

Throughout his career, Frasure has collaborated with talented individuals such as Robert L Bristol and Marie Krysak. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kent N Frasure is a distinguished inventor whose work in photoresist technology has made a lasting impact on the semiconductor industry. His innovative patents and contributions to Intel Corporation highlight his commitment to advancing technology. Frasure's ongoing efforts continue to shape the future of semiconductor manufacturing.