The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Sep. 01, 2021
Intel Corporation, Santa Clara, CA (US);
James M. Blackwell, Portland, OR (US);
Robert L. Bristol, Portland, OR (US);
Marie Krysak, Portland, OR (US);
Florian Gstrein, Portland, OR (US);
Eungnak Han, Portland, OR (US);
Kevin L. Lin, Beaverton, OR (US);
Rami Hourani, Portland, OR (US);
Shane M. Harlson, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Lined photoresist structures to facilitate fabricating back end of line (BEOL) interconnects are described. In an embodiment, a hard mask has recesses formed therein, wherein liner structures are variously disposed each on a sidewall of a respective recess. Photobuckets comprising photoresist material are also variously disposed in the recesses. The liner structures variously serve as marginal buffers to mitigate possible effects of misalignment in the exposure of photoresist material to photons or an electron beam. In another embodiment, a recess has disposed therein a liner structure and a photobucket that are both formed by self-assembly of a photoresist-based block-copolymer.