Igor Vladimirovich Fomenkov

This inventor holds 165 USPTO granted patents and 5 published patent applications, plus 1 CIPO patent and 24 EPO patents, primarily in EUV Light Source (CPC class H05G2-008). Top assignees: Cymer, Inc., Asml Netherlands B.v., Advanced Pulse Power Technologies, Inc.. Active years: 1995-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Igor Vladimirovich Fomenkov. Retrieved from https://idiyas.com/inventor/igor-vladimirovich-fomenkov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 165 (Patent Applications = 5)

% Patents Active = 75.8

CIPO Patents = 1

EPO Patents = 24 (Patent Applications = 13)

Average Co-Inventor Count = 4.1

ph-index = 39

Forward Citations = 3,901(Granted Patents)

Forward Citations (Not Self Cited) = 3,006(Dec 10, 2025)

Inventors with similar research interests:

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Company Filing History:

Asml Netherlands B.v.

patents

1 out of 1

Advanced Pulse Power Technologies, Inc.

patent

4. 1 out of 18

Cymer Laser Technologies

patents

5. 1 out of 834,570

Other

patents

where one patent can have more than one assignee

Years Active: 1995-2026

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Areas of Expertise:

EUV Light Source

Laser System

Optical Elements

Plasma Monitoring

Target Metrology

Optical Filtering

Debris Control

Thermal Monitoring

Beam Position Control

Gas Flow Stabilization

Material Supply Apparatus

Optics Cleaning

165 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12743021 - Prolonging optical element lifetime in an EUV lithography system (2026-09-22),

2. 12389519 - Guiding device and associated system (2025-08-12),

3. 12369244 - Laser system for source material conditioning in an EUV light source (2025-07-22),

4. 12287455 - Oxygen-loss resistant top coating for optical elements (2025-04-29),

5. 12171053 - System for monitoring a plasma (2024-12-17),

6. 12078934 - Laser system for target metrology and alteration in an EUV light source (2024-09-03),

7. 11846887 - Prolonging optical element lifetime in an EUV lithography system (2023-12-19),

8. 11822252 - Guiding device and associated system (2023-11-21),

9. 11340532 - Prolonging optical element lifetime in an EUV lithography system (2022-05-24),

10. 11266002 - System for monitoring a plasma (2022-03-01),

11. 10966308 - EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods (2021-03-30),

12. 10955749 - Guiding device and associated system (2021-03-23),

13. 10663866 - Wavelength-based optical filtering (2020-05-26),

14. 10635002 - Faceted EUV optical element (2020-04-28),

15. 10490313 - Method of controlling debris in an EUV light source (2019-11-26),

Title: Igor Vladimirovich Fomenkov: An Inventor Driving Innovation in Optics

Introduction:

Igor Vladimirovich Fomenkov is a prolific inventor based in San Diego, CA, known for his contributions to the field of optical technologies. With an impressive collection of 155 patents, Fomenkov's expertise lies in developing cutting-edge solutions to enhance the performance and durability of optical systems. In this article, we explore some of his latest patents, career highlights, collaborations, and the impact of his innovative work.

Latest Patents:

Fomenkov's recent patents showcase his ingenuity and dedication to pushing the boundaries of optical technology. One notable patent is "Prolonging optical element lifetime in an EUV lithography system" which addresses the degradation of reflectivity in reflective optical elements. By introducing a controlled gas into a vacuum chamber containing the optical element, Fomenkov's invention reduces reflectivity deterioration, improving the lifetime and efficiency of EUV lithography systems.

Another significant patent, "System for monitoring a plasma," focuses on monitoring plasma in optical systems. Fomenkov's invention utilizes an amplified optical beam to convert target material into a light-emitting plasma. By accessing and analyzing data related to the amplified optical beam and the resulting plasma, Fomenkov's invention provides crucial information about the conversion process and the density of the target material.

Career Highlights:

During his career, Fomenkov has made notable contributions to various companies, including Cymer, Inc. and ASML Netherlands B.V. Cymer, Inc., a renowned supplier of light sources used in semiconductor manufacturing, benefited from Fomenkov's expertise in developing advanced optical technologies. ASML Netherlands B.V., a leader in lithography systems, also recognized Fomenkov's talent, fostering an environment of innovation and collaboration.

Collaborations:

Throughout his career, Igor Vladimirovich Fomenkov has had the opportunity to collaborate with esteemed colleagues, further amplifying the impact of his innovations. William N Partlo, a fellow inventor working at Cymer, Inc., has shared expertise and worked alongside Fomenkov to drive progress in their respective fields. Additionally, Fomenkov has collaborated with Alexander Igorevich Ershov, another prominent inventor, to explore new possibilities and expand the realm of optical technologies.

Conclusion:

Igor Vladimirovich Fomenkov's extensive patent portfolio and career achievements are a testament to his remarkable contributions to the field of optical technologies. His innovative solutions, such as prolonging optical element lifetime in EUV lithography systems and monitoring plasmas, have revolutionized the performance and efficiency of optical systems. Collaborating with industry leaders and talented inventors like William N Partlo and Alexander Igorevich Ershov, Fomenkov continues to drive advancements in the field. Through his groundbreaking work, Fomenkov exemplifies the spirit of innovation and pushes the boundaries of what is possible in optics.

Profile summary based on public USPTO records.