The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Mar. 02, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Igor Vladimirovich Fomenkov, San Diego, CA (US);
Yezheng Tao, San Diego, CA (US);
Robert Jay Rafac, Encinitas, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G02F 1/01 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G02F 1/0128 (2013.01); G03F 7/70033 (2013.01);
Abstract
Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.