The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Oct. 16, 2023
Asml Netherlands B.v., Veldhoven, NL;
Dzmitry Labetski, Eindhoven, NL;
Christianus Wilhelmus Johannes Berendsen, Eindhoven, NL;
Rui Miguel Duarte Rodrigues Nunes, Eindhoven, NL;
Alexander Igorevich Ershov, Escondido, CA (US);
Kornelis Frits Feenstra, Cuijk, NL;
Igor Vladimirovich Fomenkov, San Diego, CA (US);
Klaus Martin Hummler, San Diego, CA (US);
Arun Johnkadaksham, San Diego, CA (US);
Matthias Kraushaar, Eindhoven, NL;
Andrew David Laforge, Poway, CA (US);
Marc Guy Langlois, Rancho Mirage, CA (US);
Maksim Loginov, Veldhoven, NL;
Yue Ma, Escondido, CA (US);
Seyedmohammad Mojab, San Diego, CA (US);
Kerim Nadir, Eindhoven, NL;
Alexander Shatalov, Eindhoven, NL;
John Tom Stewart, Escondido, CA (US);
Henricus Gerardus Tegenbosch, Eindhoven, NL;
Chunguang Xia, San Diego, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.