Company Filing History:
Years Active: 2021-2025
Sure, I can help you with that! Here is the article about inventor Yue Ma:
Title: Innovator Spotlight: Yue Ma - Pioneering Patents in EUV Technology
Introduction: Yue Ma, a prolific inventor based in Escondido, CA, has made groundbreaking contributions to extreme ultraviolet (EUV) technology with his series of patented inventions.
Latest Patents:
1. *Apparatus for and method of reducing contamination from source material in an EUV light source:* In this patent, Yue Ma addresses the issue of spitting of molten target material in EUV light sources by depleting hydrogen radicals, thus preventing the formation of hydrogen bubbles.
2. *Prolonging optical element lifetime in an EUV lithography system:* This patent focuses on reducing degradation in reflective optical elements by introducing controlled gas into the vacuum chamber, ultimately enhancing the overall system performance.
Career Highlights: Yue Ma is affiliated with ASML Netherlands B.V., a leading company in EUV lithography technology. His expertise and innovation have significantly impacted the advancement of EUV technology in the semiconductor industry.
Collaborations: Alongside his remarkable achievements, Yue Ma has collaborated with notable peers including Andrew David LaForge and Klaus Martin Hummler. Together, they have contributed to the development of cutting-edge solutions in the field of EUV lithography.
Conclusion: Yue Ma's relentless pursuit of innovation and his remarkable patent portfolio underscore his pivotal role in advancing EUV technology. His patents not only exemplify his technical prowess but also reflect his commitment to pushing the boundaries of semiconductor manufacturing for a brighter technological future.
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