The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Jun. 26, 2020
Asml Netherlands B.v., Veldhoven, NL;
Yue Ma, Escondido, CA (US);
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Qiushi Zhu, Harbin, CN;
Klaus Martin Hummler, San Diego, CA (US);
Peter Matthew Mayer, San Diego, CA (US);
Kay Hoffmann, San Diego, CA (US);
Andrew David LaForge, Poway, CA (US);
Igor Vladimirovich Fomenkov, San Diego, CA (US);
Daniel John William Brown, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.