Kay Hoffmann

Title: Kay Hoffmann: Innovator in Optical Technology

Introduction

Kay Hoffmann is a notable inventor based in San Diego, California. He has made significant contributions to the field of optical technology, particularly through his innovative patent related to optical elements.

Latest Patents

Hoffmann holds a patent for an "Oxygen-loss resistant top coating for optical elements." This invention provides an optical element for a lithographic apparatus. The optical element includes a capping layer that contains oxygen vacancies. These vacancies prevent the capping layer from being attacked by hydrogen and other species, thereby enhancing its durability. The capping layer allows for a low hydrogen recombination rate, enabling hydrogen to effectively clean the surface of the optical element. The capping layer may consist of an alloyed metal, a mixed metal oxide, or a doped metal oxide, with a potential composition of a ruthenium capping layer that includes one or more dopants.

Career Highlights

Hoffmann is currently employed at ASML Netherlands B.V., a leading company in the field of lithography systems for the semiconductor industry. His work has been instrumental in advancing optical technologies that are crucial for modern manufacturing processes.

Collaborations

Throughout his career, Hoffmann has collaborated with talented individuals such as Yue Ma and Marcus Adrianus Van De Kerkhof. These collaborations have contributed to the development of innovative solutions in optical technology.

Conclusion

Kay Hoffmann's contributions to optical technology through his patent and work at ASML Netherlands B.V. highlight his role as an influential inventor in the field. His innovative approaches continue to shape advancements in lithographic apparatuses.