San Diego, CA, United States of America

Marc Guy Langlois

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • San Diego, CA (US) (2020 - 2021)
  • Rancho Mirage, CA (US) (2021 - 2023)

Company Filing History:


Years Active: 2020-2025

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6 patents (USPTO):

Title: Marc Guy Langlois - Innovating Extreme Ultraviolet Radiation Systems

Introduction: Marc Guy Langlois is an accomplished inventor based in San Diego, CA, with a strong focus on cutting-edge technologies in extreme ultraviolet (EUV) radiation systems. With a portfolio of 5 patents under his belt, Langlois has made significant contributions to the field of semiconductor lithography.

Latest Patents:

1. Guiding device and associated system - Langlois' patent involves an EUV source designed with precision and efficiency in mind, utilizing advanced reflective surfaces and innovative gas flow systems to enhance the performance of EUV collectors.

2. Collector flow ring - This patent showcases Langlois' expertise in developing collector flow rings that effectively manage fuel debris in EUV radiation systems, demonstrating his commitment to improving system reliability and longevity.

Career Highlights: Langlois currently works at ASML Netherlands B.V., a renowned company in the semiconductor industry known for its groundbreaking lithography solutions. His role at ASML showcases his hands-on experience and in-depth knowledge of EUV technologies.

Collaborations: Alongside talented individuals like Yue Ma and Dzmitry Labetski, Langlois has collaborated on various projects, leveraging a diverse range of skills and expertise to drive innovation in EUV radiation systems. These collaborations highlight Langlois' ability to work effectively in a team environment and his dedication to achieving shared goals.

Conclusion: Marc Guy Langlois stands out as a prominent figure in the world of EUV radiation systems, with a track record of success in developing groundbreaking technologies. His patents and contributions reflect his passion for innovation and his commitment to pushing the boundaries of what is possible in semiconductor lithography.

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