Asml Netherlands B.v.

Marc Guy Langlois

Yue Ma

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Dzmitry Labetski

Chunguang Xia

Andrew David LaForge

Christianus Wilhelmus Johannes Berendsen

Henricus Gerardus Tegenbosch

Klaus Martin Hummler

Kornelis Frits Feenstra

Kerim Nadir

Arun Johnkadaksham

Matthias Kraushaar

Maksim Loginov

Seyedmohammad Mojab

Alexander Shatalov

John Tom Stewart

John Tom Stewart, Iv

Rui Miguel Duarte Rodrigues Nunes

Jeremy A Burke

Taylor John Hartung

Esteban Joseph Sandoval Johnson

Rui Miguel Duarte Rodreigues Nunes

Rui Miguel Duarte Rodriges Nunes

Jeremy Burke

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.

Collector flow ring

Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.

EUV cleaning systems and methods thereof for an extreme ultraviolet light source

Growing community of inventors

San Diego, CA, United States of America

Marc Guy Langlois