The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Sep. 20, 2016
Asml Netherlands B.v., Veldhoven, NL;
Alexander Anthony Schafgans, San Diego, CA (US);
Igor Vladimirovich Fomenkov, San Diego, CA (US);
Yezheng Tao, San Diego, CA (US);
Rostislav Rokitski, La Jolla, CA (US);
Robert Jay Rafac, Encinitas, CA (US);
Daniel John William Brown, San Diego, CA (US);
Cory Alan Stinson, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.