Company Filing History:

10 out of 2,874

Hitachi-high-technologies Corporation

patents

2 out of 1,116

Hitachi High-tech Corporation

patents

Years Active: 2009-2021

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10971328 - Charged particle beam device (2021-04-06),

2. 10734191 - Charged particle beam device (2020-08-04),

3. 9324540 - Charged particle beam device (2016-04-26),

4. 8729467 - Charged particle radiation device (2014-05-20),

5. 8629410 - Charged particle radiation device (2014-01-14),

6. 8431893 - Electron beam apparatus and electron beam inspection method (2013-04-30),

7. 8222601 - Scanning electron microscope and method of imaging an object by using the scanning electron microscope (2012-07-17),

8. 8207498 - Electron beam apparatus and electron beam inspection method (2012-06-26),

9. 7888640 - Scanning electron microscope and method of imaging an object by using the scanning electron microscope (2011-02-15),

10. 7875849 - Electron beam apparatus and electron beam inspection method (2011-01-25),

11. 7619219 - Scanning electron microscope (2009-11-17),

12. 7504626 - Scanning electron microscope and apparatus for detecting defect (2009-03-17),

Title: Ichiro Tachibana: Innovator in Charged Particle Beam Technology

Ichiro Tachibana is a prominent inventor based in Hitachinaka, Japan, known for his significant contributions to the field of charged particle beam devices. With a total of 12 patents to his name, Tachibana has made remarkable advancements that enhance the functionality and efficiency of these technologies.

Latest Patents

One of Tachibana's latest inventions is a charged particle beam device designed to improve the detection of secondary particles. This device features a plurality of detectors arranged symmetrically around the optical axis of a primary charged particle beam, positioned closer to the charged particle source than the objective lens. It includes electrodes that form an electric field directed towards each detector, facilitating the travel of secondary particles from a sample to the detectors. A control power supply applies voltage to these electrodes, allowing for the adjustment of the voltage to detect and control the range of azimuths of the secondary particles.

Career Highlights

Throughout his career, Ichiro Tachibana has worked with notable companies, including Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His work in these organizations has been instrumental in advancing charged particle beam technology and its applications in various fields.

Collaborations

Tachibana has collaborated with esteemed colleagues, including Naomasa Suzuki and Mitsugu Sato, contributing to the development of innovative technologies and enhancing the research capabilities within their respective fields.

Conclusion

Ichiro Tachibana's contributions to charged particle beam technology exemplify his dedication to innovation and excellence. His patents and collaborations reflect a commitment to advancing scientific understanding and practical applications in this specialized area.

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