The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Jun. 22, 2012
Muneyuki Fukuda, Kokubunji, JP;
Tomoyasu Shojo, Kokubunji, JP;
Mitsugu Sato, Hitachinaka, JP;
Atsuko Fukada, Kokubunji, JP;
Naomasa Suzuki, Hitachinaka, JP;
Ichiro Tachibana, Hitachinaka, JP;
Muneyuki Fukuda, Kokubunji, JP;
Tomoyasu Shojo, Kokubunji, JP;
Mitsugu Sato, Hitachinaka, JP;
Atsuko Fukada, Kokubunji, JP;
Naomasa Suzuki, Hitachinaka, JP;
Ichiro Tachibana, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.