The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Apr. 28, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Kazufumi Yachi, Tokyo, JP;
Muneyuki Fukuda, Tokyo, JP;
Ichiro Tachibana, Tokyo, JP;
Hiroya Ohta, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Proposed is a charged particle beam apparatus for the purpose of detecting a charged particle emitted from a sample in a specific direction by discriminating between the charged particle and a charged particle emitted in another direction. As one aspect of achieving the above purpose, proposed is a charged particle beam apparatus including an objective lens configured to focus a beam emitted from a charged particle source, a detector () configured to detect at least one of a first charged particle () emitted from a sample by irradiating the sample with the beam and a second charged particle emitted from a charged particle collided member by causing the first charged particle to collide with the charged particle collision member disposed on a trajectory of the first charged particle, and an electrostatic lens () including a plurality of electrodes disposed between the objective lens and the detector, in which the electrostatic lens is a Butler type.