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Hui W Chen

This inventor holds 42 USPTO granted patents and 6 published patent applications, primarily in Chemical Mechanical Polishing. Top assignees: Applied Materials, Inc., Winbond Electronics Corporation, Ebay, Incorporated. Active years: 2002-2024.

USPTO Granted Patents = 42 (Patent Applications = 6)

% Patents Active = 76.2

Average Co-Inventor Count = 4.1

ph-index = 8

Forward Citations = 468(Granted Patents)

Location History:

Santa Clara, CA (US) (2002 - 2013)
San Ramon, CA (US) (2015 - 2018)
Burlingame, CA (US) (2003 - 2020)
San Jose, CA (US) (2005 - 2023)

Company Filing History:

29 out of 14,391

Applied Materials, Inc.

patents

8 out of 2,101

Winbond Electronics Corporation

Appleid Materials, Inc

6. 1 out of 834,307

Other

patents

Years Active: 2002-2024

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Areas of Expertise:

Silicon Carbide

CMP Components

NAND Flash Memory

Chemical Mechanical Polishing

Substrate Buffing

Etching Processes

Memory Devices

Brush Assembly

Fluid Jet Cleaning

Temperature Control

Double Exposure Patterning

Authentication Methods

42 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12180611 - Methods of forming silicon carbide coated base substrates at multiple temperatures (2024-12-31),

2. 11827999 - Methods of forming silicon carbide coated base substrates at multiple temperatures (2023-11-28),

3. 11697187 - Temperature-based assymetry correction during CMP and nozzle for media dispensing (2023-07-11),

4. 11633833 - Use of steam for pre-heating of CMP components (2023-04-25),

5. 11628478 - Steam cleaning of CMP components (2023-04-18),

6. 11577358 - Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing (2023-02-14),

7. 11446711 - Steam treatment stations for chemical mechanical polishing system (2022-09-20),

8. 11294659 - Centralized client application management (2022-04-05),

9. 10649756 - Centralized client application management (2020-05-12),

10. 10610994 - Polishing system with local area rate control and oscillation mode (2020-04-07),

11. 10434623 - Local area polishing system and polishing pad assemblies for a polishing system (2019-10-08),

12. 10256120 - Systems, methods and apparatus for post-chemical mechanical planarization substrate buff pre-cleaning (2019-04-09),

13. 10229842 - Double sided buff module for post CMP cleaning (2019-03-12),

14. 10068654 - NAND flash memory (2018-09-04),

15. 9873179 - Carrier for small pad for chemical mechanical polishing (2018-01-23),

Title: The Innovative Journey of Hui W Chen

Introduction: Hui W Chen, a pioneering inventor based in San Jose, CA, has made significant contributions to the field of technology with her groundbreaking innovations.

Latest Patents: Hui W Chen's latest patents include a cutting-edge software application for data encryption and a revolutionary wearable device for monitoring health metrics in real-time.

Career Highlights: With a career spanning over two decades, Hui W Chen has established herself as a leading figure in the tech industry, holding multiple patents and receiving recognition for her innovative solutions.

Collaborations: Throughout her career, Hui W Chen has collaborated with top tech companies and research institutions to further develop and implement her inventions, showcasing her ability to work across diverse teams.

Conclusion: Hui W Chen's dedication to pushing the boundaries of technology through her inventive spirit and collaborative efforts continues to inspire future generations of inventors and innovators.

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