The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Dec. 12, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Haosheng Wu, San Jose, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Chih Chung Chou, San Jose, CA (US);
Jianshe Tang, San Jose, CA (US);
Hui Chen, San Jose, CA (US);
Hari Soundararajan, Sunnyvale, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/015 (2012.01); B24B 57/02 (2006.01); H01L 21/321 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B24B 37/015 (2013.01); B24B 57/02 (2013.01); H01L 21/3212 (2013.01); H01L 21/67248 (2013.01);
Abstract
A chemical mechanical polishing system includes a platen to support a polishing pad having a polishing surface, a conduit having an inlet to be coupled to a gas source, and a dispenser coupled to the conduit and having a convergent-divergent nozzle suspended over the platen to direct gas from the gas source onto the polishing surface of the polishing pad.