This inventor holds 55 USPTO granted patents and 40 published patent applications, primarily in Chemical Mechanical Polishing. Top assignee: Applied Materials, Inc.. Active years: 2000-2026.
Location History:
- Cupertino, CA (US) (2000 - 2005)
- Sunnyvale, CA (US) (2019)
- San Jose, CA (US) (2005 - 2024)
Company Filing History:
Years Active: 2000-2026
Areas of Expertise:
Title: Profile of Jianshe Tang: Innovator in Chemical Mechanical Polishing
Introduction
Jianshe Tang is an accomplished inventor based in San Jose, CA, with an impressive portfolio of 41 patents to his name. His innovative contributions primarily focus on advancements in chemical mechanical polishing systems, driving forward technology in the semiconductor manufacturing industry.
Latest Patents
Among his most recent patents, Tang has developed a groundbreaking system for temperature control during chemical mechanical polishing. This system incorporates a support structure for holding the polishing pad, a carrier head to position the substrate against the pad, and an in-situ monitoring system that generates signals indicating the amount of material present on the substrate. The system includes a temperature control mechanism that finely adjusts the temperature of the polishing process based on the collected data.
Another notable innovation is his patent for a steam-assisted single substrate cleaning process and apparatus. This method entails the rotation of a substrate while simultaneously applying steam through a nozzle assembly on both the front and back sides. Additionally, a heated chemical is introduced over the front side of the substrate, enhancing the cleaning efficiency and efficacy.
Career Highlights
Jianshe Tang is a key member of Applied Materials, Inc., a leading company in the field of semiconductor equipment and services. His experience and expertise in chemical mechanical polishing have made significant contributions to the innovations that the company offers in the industry.
Collaborations
Throughout his career, Jianshe has collaborated with notable colleagues, including Brian J. Brown and Haosheng Wu. These partnerships have likely enriched his work and fostered a collaborative environment for innovation.
Conclusion
Jianshe Tang's work exemplifies remarkable innovation in the realm of chemical mechanical polishing systems. His patents continue to pave the way for advancements in the semiconductor sector, highlighting his importance as an inventor and influencer in his field. With numerous patents under his belt, Tang remains a pivotal figure in driving forward technology and precision in semiconductor manufacturing processes.