The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Jun. 06, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Haosheng Wu, San Jose, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Hui Chen, San Jose, CA (US);
Chih Chung Chou, San Jose, CA (US);
Sih-Ling Yeh, Sunnyvale, CA (US);
Emily Drauss, Santa Clara, CA (US);
Elton Zhong, San Jose, CA (US);
Chad Pollard, San Jose, CA (US);
Songling Shin, Sunnyvale, CA (US);
Jianshe Tang, San Jose, CA (US);
Jeonghoon Oh, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical mechanical polishing system includes a first polishing station including a first platen to support a first polishing pad, a transfer station to receive a substrate from a robot, a carrier head movable on a predetermined path from the polishing station to the transfer station, a gas flow regulator having an input for a carrier gas, a liquid flow regulator having an input for a cleaning liquid, and a fluid jet cleaner at a position along the predetermined path. The fluid jet cleaner includes an atomizer nozzle including an input port coupled to the gas flow regulator, an injection port coupled to the liquid flow regulator, and an output port positioned to spray the cleaning liquid entrained in the carrier gas onto the substrate held by the carrier head when the carrier head is located above the fluid jet cleaner.