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For the Inventor, By the Inventor

Stanford, CA, United States of America

Shou-Sung Chang

This inventor holds 66 USPTO granted patents and 37 published patent applications, primarily in Chemical Mechanical Polishing (CPC class B24B). Top assignee: Applied Materials, Inc.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shou-Sung Chang. Retrieved from https://idiyas.com/inventor/shou-sung-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 66 

% Patents Active = 83.3

Average Co-Inventor Count = 5.3

ph-index = 8

Forward Citations = 249(Granted Patents)

Forward Citations (Not Self Cited) = 208(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Los Altos, CA (US) (2004 - 2011)
  • Mt. View, CA (US) (2015)
  • Stanford, CA (US) (2006 - 2016)
  • Redwood City, CA (US) (2015 - 2018)
  • Mountain View, CA (US) (2016 - 2024)

Company Filing History:

goldMedal66 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 2004-2026

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Areas of Expertise:
Polishing Slurry
Temperature Control
Steam Treatment
Fluid Lines
CMP Techniques
Substrate Monitoring
Friction Measurement
Polishing Pad Cleaning
Gas Entrainment
In-Situ Conditioning
Dishing Minimization
Electrical Connection
66 patents (USPTO):Explore Patents
1. 12728445 - Method and apparatus to clean substrate with atomizing nozzle (2026-09-08),
2. 12678912 - Chemical mechanical polishing temperature scanning apparatus for temperature control (2026-07-14),
3. 12629796 - Use of steam for pre-heating of CMP components (2026-05-19),
4. 12533771 - Polishing slurry dispense nozzle (2026-01-27),
5. 12528151 - Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing (2026-01-20),
6. 12472604 - Grounding techniques for ESD polymeric fluid lines (2025-11-18),
7. 12459078 - In-situ conditioner disk cleaning during CMP (2025-11-04),
8. 12459011 - Steam treatment stations for chemical mechanical polishing system (2025-11-04),
9. 12434347 - Method for CMP temperature control (2025-10-07),
10. 12392427 - Insulated fluid lines in chemical mechanical polishing (2025-08-19),
11. 12318882 - Apparatus and method for CMP temperature control (2025-06-03),
12. 12296427 - Apparatus and method for CMP temperature control (2025-05-13),
13. 12290897 - Fluid-tight electrical connection techniques for semiconductor processing (2025-05-06),
14. 12290896 - Apparatus and method for CMP temperature control (2025-05-06),
15. 12214468 - Temperature control of chemical mechanical polishing (2025-02-04),

Title: The Innovative Journey of Inventor Shou-Sung Chang

Introduction: Shou-Sung Chang is a pioneering inventor based in Stanford, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Shou-Sung Chang holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Shou-Sung Chang has worked tirelessly to push the boundaries of technological advancement. His work has not only revolutionized industries but has also inspired a new generation of inventors.

Collaborations: Throughout his career, Shou-Sung Chang has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work across disciplines has led to the development of cutting-edge technologies with real-world applications.

Conclusion: In conclusion, Shou-Sung Chang's relentless pursuit of innovation and his passion for creating solutions to complex problems have solidified his position as a visionary inventor. His impact on the world of technology is profound, and his legacy will continue to inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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