The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Oct. 17, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Haosheng Wu, San Jose, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Jianshe Tang, San Jose, CA (US);
Jeonghoon Oh, Saratoga, CA (US);
Chad Pollard, San Jose, CA (US);
Chih Chung Chou, San Jose, CA (US);
Ningzhuo Cui, Santa Clara, CA (US);
Hui Chen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A polishing system includes a platen to hold a polishing pad, a carrier head to hold a substrate against the polishing pad, a conditioner including a conditioner head to hold a conditioner disk against the polishing pad, a motor to move the conditioner head laterally movable relative to the platen, a conditioning disk cleaning station positioned adjacent the platen to clean the conditioning disk, and a controller configured to cause the motor to, during polishing of the substrate, move the conditioner head back and forth between a first position with the conditioner head over the polishing pad and a second position with the conditioner head in the conditioner disk cleaning station.