This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Sih-Ling Yeh: Innovator in Chemical Mechanical Polishing Technology
Introduction: Sih-Ling Yeh is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of chemical mechanical polishing. His innovative approach has led to the development of a unique method and apparatus that enhances substrate cleaning processes.
Latest Patents: Sih-Ling Yeh holds a patent for a "Method and apparatus to clean substrate with atomizing nozzle." This invention features a chemical mechanical polishing system that includes a first polishing station with a platen supporting a polishing pad, a transfer station for substrate reception, and a carrier head that moves along a predetermined path. The system is equipped with a gas flow regulator for carrier gas, a liquid flow regulator for cleaning liquid, and a fluid jet cleaner that utilizes an atomizing nozzle to spray cleaning liquid onto the substrate.
Career Highlights: Sih-Ling Yeh is currently employed at Applied Materials, Inc., where he continues to work on advancing technologies in the semiconductor industry. His expertise in chemical mechanical polishing has positioned him as a key player in the development of innovative solutions for substrate processing.
Collaborations:
Conclusion: Sih-Ling Yeh's contributions to the field of chemical mechanical polishing through his patented technology demonstrate his commitment to innovation and excellence in substrate cleaning processes. His work at Applied Materials, Inc. continues to influence advancements in the semiconductor industry.