This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations by Songling Shin in Chemical Mechanical Polishing
Introduction
Songling Shin is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of chemical mechanical polishing, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of substrate cleaning processes.
Latest Patents
Songling Shin holds a patent for a "Method and apparatus to clean substrate with atomizing nozzle." This invention describes a chemical mechanical polishing system that includes a first polishing station with a platen to support a polishing pad. The system features a transfer station for receiving substrates from a robot, a movable carrier head, and a gas flow regulator for carrier gas. Additionally, it incorporates a liquid flow regulator for cleaning liquid and a fluid jet cleaner that utilizes an atomizing nozzle. This nozzle sprays cleaning liquid entrained in carrier gas onto the substrate, ensuring thorough cleaning during the polishing process. He has 1 patent to his name.
Career Highlights
Songling Shin is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role involves developing advanced technologies that improve manufacturing processes and product quality.
Collaborations
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Conclusion
Songling Shin's innovative contributions to chemical mechanical polishing demonstrate his expertise and commitment to advancing technology in the semiconductor industry. His patent reflects a significant step forward in substrate cleaning methods, showcasing the importance of innovation in manufacturing processes.