Chubei, Taiwan

Hui OuYang


Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 123(Granted Patents)


Company Filing History:


Years Active: 2012-2017

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16 patents (USPTO):

Title: Innovations in Semiconductor Technology by Inventor Hui OuYang

Introduction

Hui OuYang, an accomplished inventor based in Chubei, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 16 patents, his innovations reflect a deep understanding of the complexities involved in semiconductor device fabrication.

Latest Patents

Among his latest patents are groundbreaking methods that enhance the efficiency and performance of semiconductor devices. One notable patent is focused on "Methods of forming a semiconductor device by thermally treating a cleaned surface of a semiconductor substrate in a non-oxidizing ambient." This patent describes a process that includes cleaning a semiconductor substrate, conducting a thermal treatment, and depositing high-k dielectric material, ultimately achieving a thin interfacial layer of less than 10 angstroms between the substrate and the dielectric material.

Another important patent, titled "End-cut first approach for critical dimension control," presents a novel method for fabricating semiconductor devices. This method incorporates an end-cut patterning process that enhances the precision in the formation of material layers over a substrate, ultimately improving the critical dimensions of semiconductor devices.

Career Highlights

Hui OuYang currently works at Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor manufacturing industry. His role enables him to apply his innovative concepts and secure patents that advance semiconductor technology. His extensive work in this company exemplifies a commitment to research and development in high-tech manufacturing.

Collaborations

Throughout his career, Hui has collaborated with talented individuals, including Matt Yeh and Ming-Huan Tsai. Their collective efforts demonstrate the power of teamwork in driving innovation and achieving breakthroughs in semiconductor technology. The synergy among these inventors often leads to the development of enhanced methodologies that improve device performance.

Conclusion

Hui OuYang's contributions to semiconductor technology through his inventive methods have significantly impacted the industry. With a solid patent portfolio and valuable collaborations, his work continues to inspire advancements in semiconductor manufacturing. As the technology evolves, Hui's innovative spirit remains a guiding force in shaping the future of semiconductor devices.

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