The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2013

Filed:

Jul. 09, 2012
Applicants:

Ming-huan Tsai, Zhubei, TW;

Hui Ouyang, Chubei, TW;

Chun-fai Cheng, Hsinchu, TW;

Wei-han Fan, Hsin-Chu, TW;

Inventors:

Ming-Huan Tsai, Zhubei, TW;

Hui Ouyang, Chubei, TW;

Chun-Fai Cheng, Hsinchu, TW;

Wei-Han Fan, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/072 (2006.01);
U.S. Cl.
CPC ...
Abstract

An integrated circuit device is disclosed. The disclosed device provides improved control over a surface proximity and tip depth of integrated circuit devices. An exemplary integrated circuit device disclosed herein has a surface proximity of about 1 nm to about 3 nm and a tip depth of about 5 nm to about 10 nm. The integrated circuit device having such surface proximity and tip depth includes an epi source feature and an epi drain feature defined by a first facet and a second facet of a substrate in a first direction, such as a {111} crystallographic plane of the substrate, and a third facet of the substrate in a second direction, such as a {100} crystallographic plane of the substrate.


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