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For the Inventor, By the Inventor

Hsinchu, Taiwan

Hsiang-Yi Wang

This inventor holds 12 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2010-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiang-Yi Wang. Retrieved from https://idiyas.com/inventor/hsiang-yi-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12

% Patents Active = 58.3

Average Co-Inventor Count = 6.5

ph-index = 4

Forward Citations = 50(Granted Patents)


Company Filing History:

goldMedal12 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2010-2023

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12 patents (USPTO):Explore Patents
1. 11545392 - Semiconductor component having through-silicon vias (2023-01-03),
2. 10784162 - Method of making a semiconductor component having through-silicon vias (2020-09-22),
3. 10115634 - Semiconductor component having through-silicon vias and method of manufacture (2018-10-30),
4. 9418923 - Semiconductor component having through-silicon vias and method of manufacture (2016-08-16),
5. 8575725 - Through-silicon vias for semicondcutor substrate and method of manufacture (2013-11-05),
6. 8487410 - Through-silicon vias for semicondcutor substrate and method of manufacture (2013-07-16),
7. 8304841 - Metal gate transistor, integrated circuits, systems, and fabrication methods thereof (2012-11-06),
8. 8138076 - MOSFETs having stacked metal gate electrodes and method (2012-03-20),
9. 7977772 - Hybrid metal fully silicided (FUSI) gate (2011-07-12),
10. 7947588 - Structure and method for a CMOS device with doped conducting metal oxide as the gate electrode (2011-05-24),
11. 7799628 - Advanced metal gate method and device (2010-09-21),
12. 7745890 - Hybrid metal fully silicided (FUSI) gate (2010-06-29),

Title: Inventor Hsiang-Yi Wang: Revolutionizing Technology in Hsinchu

Introduction: Hsiang-Yi Wang is a pioneering inventor based in Hsinchu, Taiwan, known for her groundbreaking contributions to the field of technology.

Latest Patents: Wang's latest patents focus on advancements in semiconductor technology, particularly in the development of energy-efficient microchips for various electronic devices.

Career Highlights: With a career spanning over two decades, Wang has worked with leading tech companies in Taiwan, spearheading research projects that have led to significant technological innovations in the industry.

Collaborations: Wang has collaborated with top research institutions and universities in Taiwan, fostering a culture of innovation and knowledge-sharing in the tech community.

Conclusion: Hsiang-Yi Wang's dedication to pushing the boundaries of technology and her commitment to innovation continue to inspire the next generation of inventors in Hsinchu and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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