Hojin Kim

Title: Hojin Kim: Innovator in Semiconductor Fabrication

Introduction

Hojin Kim is a prominent inventor based in Albany, NY, known for his contributions to the field of semiconductor technology. With a total of three patents to his name, he has made significant advancements in the fabrication of three-dimensional semiconductor structures.

Latest Patents

One of Hojin Kim's latest patents involves a method for fabricating a device that includes forming a layer stack of alternating layers of a first spin-on material and a second spin-on material on a substrate. This innovative method utilizes spin-on deposition to create each layer, followed by etching first openings and filling them with a third material. Additionally, he has developed a method for selective etching using fluorine, oxygen, and noble gas-containing plasmas, which enhances the processing of substrates in plasma processing chambers.

Career Highlights

Hojin Kim has worked with notable companies such as Tokyo Electron Limited and Université D'Orléans. His experience in these organizations has contributed to his expertise in semiconductor fabrication and plasma processing technologies.

Collaborations

Hojin has collaborated with talented individuals in his field, including Soo Doo Chae and Karthikeyan Pillai. These collaborations have further enriched his work and innovations in semiconductor technology.

Conclusion

Hojin Kim's contributions to semiconductor fabrication and his innovative patents highlight his role as a key figure in advancing technology in this field. His work continues to influence the development of new semiconductor structures and processing methods.