The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Jan. 30, 2024
Tokyo Electron Limited, Tokyo, JP;
Hojin Kim, Albany, NY (US);
Minseok Oh, Albany, NY (US);
Soo Doo Chae, Albany, NY (US);
Toru Hisamatsu, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of forming contacts includes forming a conformal etch stop layer over a staircase layer stack substrate, the staircase layer stack substrate including a plurality of steps on a substrate, each step including a pair of a first layer and a second layer and having a sidewall extending from one step to another step. The method further includes patterning the etch stop layer to remove portions of the etch stop layer covering the sidewalls of the steps and form islands of the etch stop layer. The method further includes replacing the second layer with a conductive material and simultaneously forming contact features through the islands of the etch stop layer to the conductive material, the contact features to different steps of the plurality of steps having different lengths.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile