This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Minseok Oh - Innovator in Plasma Processing Technologies
Introduction
Minseok Oh is an inventor based in Albany, NY (US). He is known for his contributions to the field of plasma processing technologies. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.
Latest Patent Applications
1. **METHOD FOR ETCHING A PATTERN IN A LAYER OF A SUBSTRATE** - This method involves holding a substrate in a plasma chamber, where the substrate includes a patterned tungsten silicon nitride (WxSiyNz) layer over a dielectric layer. The process includes flowing a gas over the substrate, ionizing the gas to generate plasma, and selectively etching the dielectric layer to form a patterned dielectric layer.
2. **PLASMA PROCESSING SYSTEM WITH DIRECT CURRENT SUPERPOSITION** - This application discloses a plasma processing system that includes a chamber designed to house plasma in a process space. The system features two chamber components with differing DC potentials applied, enhancing the efficiency of the plasma processing.
Conclusion
Minseok Oh's work in plasma processing technologies showcases his innovative spirit and potential for future contributions to the field. His latest patent applications reflect a commitment to advancing technology in substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile