Fukushima, Japan

Hisashi Masumura

This inventor holds 37 USPTO granted patents and 5 published patent applications, primarily in Semiconductor Polishing. Top assignees: Shin-Etsu Handotai Co., Ltd., Fujikoshi Machinery Corp., Rodel Nitta Company. Active years: 1995-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Masumura. Retrieved from https://idiyas.com/inventor/hisashi-masumura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 37 

% Patents Active = 91.9

Average Co-Inventor Count = 3.3

ph-index = 11

Forward Citations = 411(Granted Patents)


Location History:

  • Nishigo, JP (1996)
  • Nishigou-mura, JP (1998 - 2000)
  • Fukushima-ken, JP (1997 - 2002)
  • Nishi-shirakawa-gun, JP (1998 - 2002)
  • Fukushima, JP (1995 - 2012)
  • Nishishirakawa, JP (2001 - 2014)
  • Yabukimachi, JP (2016)

Company Filing History:


Years Active: 1995-2025

Loading Chart...
Areas of Expertise:
Epitaxial Wafer
Polishing Head
Polishing Apparatus
Wafer Cleaning
Workpiece Holder
Double-Sided Polishing
Polishing Method
Semiconductor Wafer
Polishing Pad
Polishing Agent
Wafer Manufacturing
Residual Damage
37 patents (USPTO):Explore Patents

Title: Innovations of Hisashi Masumura in Polishing Technology

Introduction

Hisashi Masumura, a prominent inventor based in Fukushima, Japan, has made significant contributions to the field of polishing technology. With an impressive portfolio of 36 patents, his innovative work has advanced various industrial processes, particularly in the precision polishing of workpieces.

Latest Patents

Masumura's latest patents focus on polishing heads and polishing apparatuses that enhance the efficiency and quality of surface finishing. One such patent describes a polishing head that includes an annular rigid ring, an elastic film bonded to the rigid ring, and a movable mid-plate. This design allows for the polishing of a workpiece's front surface without generating surface defects. The mid-plate can adjust the shape of the elastic film's lower surface by altering its vertical position, which facilitates the even polishing of various workpiece shapes. Another patent elaborates on a polishing apparatus that utilizes a rubber film for holding the workpiece, allowing for adjustable polishing profiles based on the workpiece's shape, thereby ensuring a high degree of flatness and improved polishing outcomes.

Career Highlights

Throughout his career, Hisashi Masumura has worked with notable companies including Shin-Etsu Handotai Co., Ltd. and Fujikoshi Machinery Corporation. His roles in these organizations have allowed him to develop and refine his innovative polishing technologies, making a lasting impact on the industry.

Collaborations

Masumura's collaborations with esteemed colleagues such as Hideo Kudo and Kiyoshi Suzuki have further advanced his research and innovations. Their collective expertise has been instrumental in creating solutions that enhance the effectiveness of polishing operations in various applications.

Conclusion

In summary, Hisashi Masumura is a visionary inventor whose work in polishing technology continues to influence the industry profoundly. His 36 patents reflect a commitment to innovation and excellence, paving the way for improved manufacturing processes that yield high-quality finishes on critical workpieces. As he continues to innovate, the impacts of his contributions will undoubtedly be felt across multiple sectors, enhancing both efficiency and product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…