The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Oct. 18, 2007
Hisashi Masumura, Nishishirakawa, JP;
Koji Kitagawa, Nishishirakawa, JP;
Kouji Morita, Nishishirakawa, JP;
Hiromi Kishida, Nagano, JP;
Satoru Arakawa, Nagano, JP;
Hisashi Masumura, Nishishirakawa, JP;
Koji Kitagawa, Nishishirakawa, JP;
Kouji Morita, Nishishirakawa, JP;
Hiromi Kishida, Nagano, JP;
Satoru Arakawa, Nagano, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Fujikoshi Machinery Corp., Nagano-shi, JP;
Abstract
The present invention is a polishing head provided with an annular rigid ring, a rubber film bonded to the rigid ring with a uniform tension, a mid plate joined to the rigid ring and forming a space portion together with the rubber film and the rigid ring, and an annular template provided concentrically with the rigid ring in a peripheral portion on a lower face part of the rubber film and having an outer diameter larger than an inner diameter of the rigid ring, in which a pressure of the space portion can be changed by a pressure adjustment mechanism, a back face of a work is held on the lower face part of the rubber film, and a surface of the work is brought into sliding contact with the polishing pad attached onto a turn table for performing polishing, and an inner diameter of the template is smaller than an inner diameter of the rigid ring, and a ratio between an inner diameter difference between the rigid ring and the template and a difference between the inner diameter and an outer diameter of the template is 26% or more and 45% or less. Thereby, a polishing head and the like that can obtain constant flatness stably can be provided.