The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Oct. 20, 2008
Hisashi Masumura, Nishishirakawa, JP;
Kouji Morita, Nishishirakawa, JP;
Hiromasa Hashimoto, Nishishirakawa, JP;
Satoru Arakawa, Nagano, JP;
Hiromi Kishida, Nagano, JP;
Hisashi Masumura, Nishishirakawa, JP;
Kouji Morita, Nishishirakawa, JP;
Hiromasa Hashimoto, Nishishirakawa, JP;
Satoru Arakawa, Nagano, JP;
Hiromi Kishida, Nagano, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Fujikoshi Machinery Corp., Nagano, JP;
Abstract
The present invention is a polishing head in which a rubber film is formed in a boot shape in such a manner that a position where the rubber film is held by a mid plate is distantly positioned from a work holding portion; an end portion of the boot shaped rubber film is formed in O-ring shape so that the rubber film is held by the mid plate with decreasing an area of contact between the mid plate and the rubber film as much as possible. As a result, there is provided a polishing head with rubber chuck method in which an occurrence of a surface defect, such as a scratch, on a surface of the work is suppressed as much as possible and the work can be uniformly and stably polished to the outer periphery.