Company Filing History:

12 out of 10,326

Tokyo Electron Limited

patents

1 out of 113

Kurashiki Boseki Kabushiki Kaisha

patents

where one patent can have more than one assignee

Years Active: 2013-2025

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12427551 - Filter cleaning system and filter cleaning method (2025-09-30),

2. 11862486 - Substrate liquid processing apparatus, substrate liquid processing method and recording medium (2024-01-02),

3. 11712710 - Substrate processing apparatus and substrate processing method (2023-08-01),

4. 11353894 - Liquid processing apparatus and liquid processing method (2022-06-07),

5. 11094568 - Processing apparatus, abnormality detection method, and storage medium (2021-08-17),

6. 10770316 - Substrate liquid processing apparatus, substrate liquid processing method and recording medium (2020-09-08),

7. 10591935 - Substrate liquid processing apparatus and substrate liquid processing method (2020-03-17),

8. 10573539 - Substrate liquid processing apparatus (2020-02-25),

9. 10162371 - Substrate liquid processing apparatus and substrate liquid processing method (2018-12-25),

10. 10153182 - Substrate processing apparatus (2018-12-11),

11. 9452397 - Liquid processing apparatus, liquid processing method, and storage medium that stores computer program for implementing liquid processing method (2016-09-27),

12. 8567417 - Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method (2013-10-29),

Title: Innovations of Hiroshi Komiya

Introduction

Hiroshi Komiya is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of technology, particularly in the development of advanced filtration and substrate processing systems. With a total of 12 patents to his name, Komiya's work reflects his dedication to innovation and problem-solving.

Latest Patents

Among his latest patents is a filter cleaning system and method. This system includes a storage unit that holds liquid passed through a filter, a liquid supply path that directs the stored liquid to the filter, and a circulation path that returns the liquid from the filter back to the storage unit. Additionally, it features a first supply unit that provides a first liquid to the storage unit and a second supply unit that supplies a second liquid with lower surface tension and an affinity for the first liquid. Another notable patent is for a substrate liquid processing apparatus, which includes a substrate holding unit designed to hold a substrate. This apparatus discharges a processing liquid toward the substrate's surface from an outer nozzle, ensuring that at least the central portion of the surface is covered with a liquid film.

Career Highlights

Hiroshi Komiya has worked with several esteemed companies throughout his career. Notably, he has been associated with Tokyo Electron Limited and Kurashiki Boseki Kabushiki Kaisha. His experience in these organizations has allowed him to refine his skills and contribute

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