The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Apr. 24, 2018
Tokyo Electron Limited, Tokyo, JP;
Kenji Nakamizo, Koshi, JP;
Satoshi Morita, Koshi, JP;
Akinori Tanaka, Koshi, JP;
Hiroshi Komiya, Koshi, JP;
Mikio Nakashima, Koshi, JP;
Kousuke Fukuda, Koshi, JP;
Youichi Masaki, Koshi, JP;
Ryoji Ando, Koshi, JP;
Ikuo Sunaka, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.