Akinori Tanaka

Title: Akinori Tanaka: Innovator in Substrate Liquid Processing Technology

Introduction

Akinori Tanaka is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate liquid processing, holding a total of three patents. His innovative work focuses on enhancing the efficiency and accuracy of liquid discharge methods.

Latest Patents

Tanaka's latest patents include a "Substrate Liquid Processing Apparatus and Liquid Discharge Evaluation Method." This invention features a controller designed to manage liquid supply, allowing for continuous adjustment of the landing position of liquid on a substrate surface. The controller derives discharge position deviation information by comparing temperature data collected during the movement of a liquid discharge nozzle along different paths. Another notable patent is the "Substrate Liquid Processing Apparatus and Substrate Liquid Processing Method," which incorporates a liquid pipe system, a discharge nozzle, and a valve mechanism to regulate the flow of processing liquid. This apparatus is equipped with a liquid detection sensor to monitor the presence of processing liquid at specific measurement points.

Career Highlights

Akinori Tanaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative technologies, contributing to advancements in substrate processing.

Collaborations

Tanaka collaborates with notable colleagues, including Mikio Nakashima and Terufumi Wakiyama. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Akinori Tanaka's contributions to substrate liquid processing technology exemplify his commitment to innovation. His patents reflect a deep understanding of liquid dynamics and processing efficiency, positioning him as a key figure in his field.