Tokyo Electron Limited

Kurashiki Boseki Kabushiki Kaisha

Hiroshi Komiya

Atsushi Anamoto

Takahisa Otsuka

Keigo Satake

Yasuhiro Takaki

Gentaro Goshi

Yoshihiro Kai

Kazuki Kosai

Chikara Nobukuni

Seiya Fujimoto

Yuji Kamikawa

Nobuhiro Ogata

Hideaki Sato

Koji Tanaka

Hiroaki Inadomi

Satoshi Morita

Takami Satoh

Mikio Nakashima

Koji Egashira

Hiromi Kiyose

Kazuyoshi Eshima

Fumihiro Kamimura

Ikuo Sunaka

Kenji Nakamizo

Kouji Ogura

Shinichi Umeno

Noboru Higashi

Akinori Tanaka

Satoru Hiraki

Ryoji Ando

Hideyuki Yamamoto

Yuki Otsuka

Kousuke Fukuda

Youichi Masaki

A filter cleaning system includes a storage unit that stores liquid that is passed through a filter; a liquid supply path that sends the liquid stored in the storage unit to the filter; a circulation path that returns the liquid sent from the filter to the storage unit; a first supply unit that supplies a first liquid to the storage unit; and a second supply unit that supplies a second liquid having a surface tension lower than that of the first liquid and an affinity for the first liquid, to the storage unit.

Filter cleaning system and filter cleaning method

A substrate processing apparatus includes a substrate holding unitconfigured to hold a substrate W; an outer nozzleconfigured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator() configured to change a height position or a discharge angle of the outer nozzle.

Substrate liquid processing apparatus, substrate liquid processing method and recording medium

A substrate processing apparatus includes: a processing chamber in which a substrate is processed with a processing liquid; a nozzle having a discharge port from which the processing liquid is discharged, the discharge port being formed in a distal end portion of the nozzle; a nozzle bath including an accommodation chamber formed therein, wherein the distal end portion of the nozzle is accommodated in the accommodation chamber at a standby time at which the processing liquid is not supplied to the substrate; a circulation line configured to return the processing liquid, which is discharged from the nozzle to the nozzle bath, to the nozzle; and a first restraint part configured to restrain a gas from flowing between an outside of the nozzle bath and the processing liquid present inside the nozzle bath when the processing liquid discharged from the nozzle to the nozzle bath is circulated to the nozzle.

Substrate processing apparatus and substrate processing method

A liquid processing apparatus includes: a substrate processing unit; a supply line that supplies the fluid to the substrate processing unit; a flow meter that measures a flow rate of the fluid flowing through the supply line; a flow rate adjustment mechanism that adjusts the flow rate of the fluid flowing through the supply line; and a controller that control the flow rate adjustment mechanism based on a measurement result of the flow meter. The controller receives the measurement result at a first cycle. When the measurement result of the flow meter indicates that the flow rate of the fluid flowing through the supply line is included in a preset range, the controller causes the flow rate adjustment mechanism to adjust the flow rate of the fluid flowing through the supply line at a cycle having a time interval longer than a time interval of the first cycle.

Liquid processing apparatus and liquid processing method

A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.

Processing apparatus, abnormality detection method, and storage medium

A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

Substrate liquid processing apparatus and substrate liquid processing method

A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.

Substrate liquid processing apparatus

A substrate processing apparatus that performs processing by immersing a substrate into a processing liquid obtained by mixing phosphoric acid with a diluent includes a concentration sensing means for sensing the concentration of the processing liquid by measuring the absorbance characteristics of the processing liquid. The concentration sensing means includes a light-transmitting section that introduces the processing liquid into the inside to let the processing liquid pass therethrough, a light-emitting section that radiates light having a predetermined wavelength to the light-transmitting section, a light-receiving section that receives the light therefrom via the light-transmitting section, a first lens that condenses the light emitted from the light-emitting section to the light-transmitting section, a second lens that condenses the light that has passed through the light-transmitting section to the light-receiving section, and a cooling mechanism that cools at least one of these.

Substrate processing apparatus

A liquid processing apparatusincludes a pure water supply source; a pure water flow rate control opening/closing valve; a sulfuric acid supply unit; a sulfuric acid supply opening/closing valve; mixing tanksandconfigured to mix pure water and sulfuric acid to produce a mixed chemical liquid and connected to a circulation linehaving a circulation pump; a liquid processing unitconfigured to perform a liquid process on a substrate W with the mixed chemical liquid. A controllercontrols a pure water supply opening/closing valve, the sulfuric acid supply opening/closing valve, and the circulation pump, such that operation of the circulation pumpis started after starting supply of the pure water to the mixing tanksand, and then, supply of sulfuric acid to the mixing tanksandis started.

Liquid processing apparatus, liquid processing method, and storage medium that stores computer program for implementing liquid processing method

An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object.

Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method

Growing community of inventors

Koshi, Japan

Hiroshi Komiya