The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Dec. 15, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hiroshi Komiya, Koshi, JP;

Yasuhiro Takaki, Koshi, JP;

Shinichi Umeno, Koshi, JP;

Koji Tanaka, Koshi, JP;

Takami Satoh, Koshi, JP;

Atsushi Anamoto, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67023 (2013.01); B08B 3/04 (2013.01); H01L 21/67173 (2013.01); B08B 2203/027 (2013.01);
Abstract

A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.


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