Hiroki Miyake

Title: Hiroki Miyake: Innovator in Semiconductor Technology

Introduction

Hiroki Miyake is a prominent inventor based in Toyota, Japan, known for his significant contributions to semiconductor technology. With a total of 14 patents to his name, he has made remarkable advancements in the field, particularly focusing on gallium oxide-based semiconductor substrates.

Latest Patents

Miyake's latest patents include a surface treatment method for gallium oxide-based semiconductor substrates and a method for manufacturing semiconductor devices. The surface treatment method involves flattening the surface of the gallium oxide-based semiconductor substrate through dry etching with a self-bias of 150 V or more. Following this process, the substrate is washed with a chemical solution containing HSO to reveal a step terrace structure. His method for manufacturing semiconductor devices includes preparing a substrate made of a compound semiconductor and causing an electric current to flow through it. This innovative approach allows for the division of the substrate along a cleavage plane, enhancing the efficiency of semiconductor devices.

Career Highlights

Miyake has worked with notable companies such as Toyota Motor Corporation and Denso Corporation. His experience in these leading organizations has allowed him to develop and refine his expertise in semiconductor technology, contributing to the advancement of the industry.

Collaborations

Miyake has collaborated with esteemed colleagues, including Tatsuji Nagaoka and Shuhei Ichikawa. Their combined efforts have fostered innovation and progress in semiconductor research and development.

Conclusion

Hiroki Miyake's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents and collaborations reflect his commitment to enhancing the capabilities of semiconductor devices, making a lasting impact on the industry.