Location History:
- Yamaguchi, JP (2004)
- Kudamatsu, JP (2003 - 2015)
Company Filing History:
Years Active: 2003-2015
Title: Hiroaki Ishimura: Innovator in Semiconductor Technology
Introduction
Hiroaki Ishimura is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work primarily focuses on improving manufacturing methods for NAND flash memory and plasma processing techniques.
Latest Patents
Ishimura's latest patents include a semiconductor device manufacturing method that enhances the fabrication process of NAND flash memory with a three-dimensional structure. This method prevents pattern deformation and falling during the division of gates in multi-layered films. He establishes a critical ratio of length L to height h of control gate groups, ensuring it remains below 1.65 to avoid buckling. Additionally, he suggests that the ratio of length L to width W of the control gate groups should be less than 16.5. Another notable patent is a plasma processing method that effectively suppresses sideetching and microloading. This method involves forming trenches through plasma etching, applying a nitride film on the sidewalls, and subsequently forming an oxide film on the sidewalls and bottom surfaces of the trenches.
Career Highlights
Throughout his career, Ishimura has worked with esteemed companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that enhance manufacturing efficiency and product reliability.
Collaborations
Ishimura has collaborated with notable colleagues, including Go Saito and Masamichi Sakaguchi. Their combined efforts have led to innovative solutions in semiconductor manufacturing processes.
Conclusion
Hiroaki Ishimura's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in memory technology and plasma processing methods.