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For the Inventor, By the Inventor

Yamanashi, Japan

Hiroaki Ikegawa

This inventor holds 17 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Tokyo Electron Limited. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroaki Ikegawa. Retrieved from https://idiyas.com/inventor/hiroaki-ikegawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 88.2

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 483(Granted Patents)


Location History:

  • Tokyo-To, JP (2006)
  • Iwate, JP (2015 - 2016)
  • Yamanashi, JP (2014 - 2021)
  • Nirasaki, JP (2017 - 2021)

Company Filing History:

goldMedal17 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2006-2025

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Areas of Expertise:
Film Deposition
Substrate Processing
Semiconductor Device
Film Formation
Heat Treatment
Turntable Apparatus
Manufacturing Method
Storage Medium
Apparatus
Processing Method
17 patents (USPTO):Explore Patents
1. 12334380 - Boat transfer method and heat treatment apparatus (2025-06-17),
2. 11171014 - Substrate processing method and substrate processing apparatus (2021-11-09),
3. 10900121 - Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device (2021-01-26),
4. 10550470 - Film forming apparatus and operation method of film forming apparatus (2020-02-04),
5. 10550467 - Film formation apparatus (2020-02-04),
6. 10519550 - Film formation apparatus (2019-12-31),
7. 10438791 - Film forming method, film forming apparatus, and storage medium (2019-10-08),
8. 10297443 - Semiconductor device manufacturing method and semiconductor device manufacturing system (2019-05-21),
9. 9640448 - Film forming method, film forming apparatus, and storage medium (2017-05-02),
10. 9252043 - Film deposition method (2016-02-02),
11. 9136133 - Method of depositing film (2015-09-15),
12. 8987147 - Method of depositing a film using a turntable apparatus (2015-03-24),
13. 8980371 - Film deposition method (2015-03-17),
14. 8962495 - Film deposition method (2015-02-24),
15. 8921237 - Method of depositing a film (2014-12-30),

Title: Hiroaki Ikegawa: Innovator in Substrate Processing Technologies

Introduction

Hiroaki Ikegawa is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 17 patents. His innovative work has advanced technologies that are crucial for various applications in the semiconductor industry.

Latest Patents

Ikegawa's latest patents include a boat transfer method and a heat treatment apparatus. The boat transfer method is designed for transferring a boat that holds a substrate into a processing chamber. This method involves supplying a reducing gas into the processing chamber while transferring the boat in a state where the reducing gas is present. Another notable patent is the substrate processing method and apparatus, which includes forming a silicon nitride film on an etching target film, oxidizing the surface to create an oxide layer, and etching the target film using a halogen-containing etching gas.

Career Highlights

Hiroaki Ikegawa is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. His work at the company has been instrumental in developing advanced technologies that enhance substrate processing efficiency and effectiveness.

Collaborations

Ikegawa has collaborated with notable coworkers such as Jun Ogawa and Kentaro Oshimo. Their combined expertise has contributed to the successful development of innovative solutions in the field.

Conclusion

Hiroaki Ikegawa's contributions to substrate processing technologies have established him as a key figure in the industry. His patents reflect a commitment to innovation and excellence in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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