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For the Inventor, By the Inventor

Kawagoe, Japan

Haruhiko Komoriya

This inventor holds 57 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Fluoropolymer Technology (CPC class G03F). Top assignees: Central Glass Company, Limited, Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd.. Active years: 1990-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruhiko Komoriya. Retrieved from https://idiyas.com/inventor/haruhiko-komoriya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 57 

% Patents Active = 57.9

 

Average Co-Inventor Count = 5.1

ph-index = 9

Forward Citations = 276(Granted Patents)

Forward Citations (Not Self Cited) = 250(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kamifukuoka City, JP (1990)
  • Kamifukuoka, JP (1990)
  • Kawagoe, JP (2003 - 2012)
  • Iruma-gun, JP (2013 - 2016)
  • Saitama, JP (2001 - 2018)

Company Filing History:

goldMedal55 out of 1,011 
 
Central Glass Company, Limited
 patents
silverMedal18 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents
bronzeMedal13 out of 27,375 
 
Matsushita Electric Industrial Co., Ltd.
 patents
4. 3 out of 16,454 
 
Panasonic Corporation
 patents
5. 2 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 1990-2018

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Areas of Expertise:
Fluoropolymer
Resist Composition
Anti-Reflection Film
Polymer Membrane
Film-Forming Composition
Pattern Formation
Proton Conducting
Solid Electrolyte
Fluorinated Compounds
Cyclic Fluorine
Top Coat Composition
Ester Compounds
57 patents (USPTO):Explore Patents
1. 9966575 - Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition (2018-05-08),
2. 9842993 - Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same (2017-12-12),
3. 9678426 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2017-06-13),
4. 9678425 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2017-06-13),
5. 9650451 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2017-05-16),
6. 9512070 - Method for producing compound containing BIS (perfluoroalkylsulfonyl) methyl group and salt thereof, and solid electrolyte membrane produced using same (2016-12-06),
7. 9318764 - Proton conducting polymer membrane, membrane-electrode assembly using same, and polymer electrolyte fuel cell (2016-04-19),
8. 9310682 - Positive-type resist composition (2016-04-12),
9. 9204652 - Antibacterial agent, substrate surface treatment method using the same, antibacterial agent composition, and substrate surface treatment method using the same (2015-12-08),
10. 9171655 - Solid electrolyte film, and method for producing same (2015-10-27),
11. 8822588 - Fluorine-containing polymer and anti-static agent wherein same is used (2014-09-02),
12. 8716385 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2014-05-06),
13. 8691491 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2014-04-08),
14. 8663903 - Top coating composition (2014-03-04),
15. 8592508 - Top coat composition (2013-11-26),

Title: Innovator Spotlight: Haruhiko Komoriya

Introduction:

Haruhiko Komoriya, a prolific inventor based in Kawagoe, Japan, has made significant contributions to the field of organic semiconductor elements. With a remarkable portfolio of 57 patents, Komoriya's innovative work has advanced the development of film-forming compositions essential in modern technology.

Latest Patents:

Among his latest patents is a groundbreaking composition for forming films, which includes a fluororesin with specific chemical structures and a fluorine-containing solvent. This composition is tailored for manufacturing organic semiconductor elements, providing superior resistance to etching solvents during fine pattern processing.

Career Highlights:

Komoriya has honed his expertise while working at esteemed companies such as Central Glass Company, Limited, and Shin-Etsu Chemical Co., Ltd. His experience in these leading organizations has undoubtedly influenced his innovative approach to developing cutting-edge technologies in the organic semiconductor industry.

Collaborations:

Throughout his career, Komoriya has collaborated with industry peers such as Kazuhiko Maeda and Jun Hatakeyama. These collaborations have not only facilitated knowledge exchange but have also paved the way for groundbreaking discoveries in the realm of film-forming compositions for organic semiconductor elements.

Conclusion:

In conclusion, Haruhiko Komoriya's exceptional talent and dedication to innovation have positioned him as a key figure in the advancement of organic semiconductor technology. His contributions through numerous patents and fruitful collaborations underscore his commitment to pushing the boundaries of scientific discovery and technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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