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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9678426 B1

PDFFull Text
Date of Patent:
Jun. 13, 2017

Filed:

Apr. 07, 2014

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Haruhiko Komoriya, Saitama, JP;

Shinichi Sumida, Kawagoe, JP;

Kenjin Inomiya, Fujimino, JP;

Takashi Mori, Fujimino, JP;

Takamasa Kitamoto, Asaka, JP;

Yusuke Kanto, Fujimino, JP;

Assignee:

Central Glass Company, Limited, Ube-shi, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Mark Kaucher

Assistant Examiner:

Henry Hu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C09D 133/16 (2006.01); G03F 7/038 (2006.01); C08F 20/28 (2006.01); C08F 220/24 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 20/28 (2013.01); C08F 220/24 (2013.01); G03F 7/004 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); Y10T 428/24479 (2015.01);
Abstract

Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, Rrepresents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). Rand Reach independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

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