IDiyas

For the Inventor, By the Inventor

Kawagoe, Japan

Shinichi Sumida

USPTO Granted Patents = 16

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 61(Granted Patents)


Location History:

  • Saitama, JP (2005 - 2017)
  • Kawagoe, JP (2007 - 2017)

Company Filing History:

goldMedal16 out of 1,000 
 
Central Glass Company, Limited
 patents

Years Active: 2005-2017

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16 patents (USPTO):
1. 9678426 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2017-06-13),
2. 9678425 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2017-06-13),
3. 9650451 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2017-05-16),
4. 8716385 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation (2014-05-06),
5. 8691491 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2014-04-08),
6. 8592508 - Top coat composition (2013-11-26),
7. 8115036 - Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern (2012-02-14),
8. 7947422 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2011-05-24),
9. 7781602 - Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same (2010-08-24),
10. 7736835 - Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern (2010-06-15),
11. 7402626 - Top coat composition (2008-07-22),
12. 7232917 - Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation (2007-06-19),
13. 7125943 - Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions (2006-10-24),
14. 7122292 - Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same (2006-10-17),
15. 7105618 - Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same (2006-09-12),

Title: Shinichi Sumida: Pioneering Innovations in the World of Fluoropolymer Materials

Introduction:

Shinichi Sumida, a distinguished inventor hailing from Kawagoe, JP, has established himself as a trailblazer in the realm of inventions through his passion for innovation and relentless pursuit of excellence. With 16 patents to his name, Sumida's work continues to inspire future generations of inventors worldwide.

Latest Patents:

Among his latest patents is the groundbreaking invention of a polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation. This innovative fluoromonomer, suitable for microfabrication in immersion exposure or double patterning processes, underscores Sumida's commitment to pushing the boundaries of materials science.

Career Highlights:

Shinichi Sumida is currently affiliated with the respected Central Glass Company, Limited. His tenure at the company has been marked by a series of innovative breakthroughs in the field of fluoropolymer materials, solidifying his reputation as a leading figure in the industry.

Collaborations:

Throughout his career, Sumida has collaborated closely with esteemed colleagues such as Haruhiko Komoriya and Kazuhiko Maeda. Together, they have synergized their expertise to drive forward cutting-edge research and development projects, further cementing Sumida's legacy as an industry trailblazer.

Conclusion:

In conclusion, Shinichi Sumida's unwavering dedication to innovation and his pioneering spirit in the development of fluoropolymer materials have positioned him as a true luminary in the world of inventions. His contributions not only inspire those around him but also underscore the transformative power of creativity and perseverance in shaping a brighter future for generations to come.

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