Central Glass Company, Limited

Shinichi Sumida

Haruhiko Komoriya

Kazuhiko Maeda

Takashi Mori

Kenjin Inomiya

Takamasa Kitamoto

Yusuke Kanto

Michitaka Ootani

Takeo Komata

Satoru Miyazawa

Satoru Kobayashi

Takashi Kume

Katsutoshi Suzuki

Katsunori Kawamura

Sunao Koga

Michitaka Otani

Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, Rrepresents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). Rand Reach independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure. 

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

A fluorine-containing compound represented by the formula 1, 

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, Rrepresents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and Ror Rrepresents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

Top coat composition

The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R-Rand R-Rare independently a hydrogen atom, a halogen atom, or a C-Cstraight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. Rand R, Rand R, or Rand Rmay be bonded together to form a ring. In such a case, it is a C-Calkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, 'a' is 0 or 1, 'b' is an integer of 0-2 and &#x201c;c&#x201d; is an integer of 0-2.

Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern

The invention relates to a fluorine-containing compound represented by the formula 1, 

The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same. 

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same

The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C-Ccyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C-Cstraight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.

The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.

The present invention provides a fluorine-containing cyclic compound represented by general formula (1): wherein Rrepresents a halogen atom, and Rand Reach represents hydrogen or a hydrocarbon group. The above-mentioned hydrocarbon group is a straight-chain, branched or cyclic hydrocarbon group having 1 to 25 carbon atoms or an aromatic hydrocarbon group, and may contain a halogen atom, an oxygen atom, a nitrogen atom or a sulfur atom. Further, a fluorine-containing polymerizable monomer derived from the above-mentioned fluorine-containing cyclic compound, a fluorine-containing polymer compound obtained by polymerization or copolymerization using the above-mentioned compound or monomer, further a resist material and a pattern forming process using the above-mentioned polymer compound are also disclosed. According to the invention, there is provided the polymer compound suitable for a resist material having high transparency in a wide wavelength region from an ultraviolet region to a near-infrared light region, high adhesion to a substrate, film forming properties, high etching resistance and a high glass transition point at once, particularly for a photoresist material in a vacuum ultraviolet wavelength region. Further, the pattern forming process using the polymer compound is suitable for the formation of a high-resolution pattern form.

Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation

The present invention relates to novel first to fourth lactone compounds. The first lactone compound is represented by the formula (1), in the formula, X represents CH, CHCH, O, S or NR, and Rrepresents hydrogen atom, a straight-chain, branched or cyclic alkyl group of a carbon number of 1&#x2013;10. Hydrogen(s) of the alkyl group may partially or entirely be replaced with fluorine atom(s). Furthermore, a part of the alkyl group may contain an atomic group containing oxygen atom, sulfur atom, nitrogen atom, carbon-carbon double bond, carbonyl group, hydroxy group or carboxyl group.

Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same

The present invention relates to a fluorine-containing polymerizable monomer having a structure of the general formula (1), 

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Kawagoe, Japan

Shinichi Sumida